Learn more about our scanning electron microscopes which can be utilised for a range of research and industrial applications.
- Schottky field-emission electron source combined with field-free optics for UHR SEM applications
- Imaging surfaces with sub-nm resolution
- Stage biasing for low voltage imaging
- Highly diverse BSE imaging capability using various in-chamber and in-column detectors enabling energy and angular filtering to capture very fine detail
- Equipped with Mistral™ Plasma FIB optimised for both large area studies and for precise TEM or APT sample preparation
- 1mm plasma FIB column field of view enables large area sample prep as well as EDS and EBSD analysis in 3D
- Multi gas injection systems with range precursor gas options
- Integrated Oxford Instrument EDS and EBSD system with optimised TKD geometry
- Advanced techniques for seamless inverted or planar TEM sample geometry enabled by TECAN OptiLift manipulator
- Load lock for fast loading and unloading of samples
- Double tile stage for smooth surface milling of heterogenous materials
- Automated 3D imaging, EDS and EBSD mapping capabilities
- Schottky field-emission electron source combined with field free optics for UHR SEM applications
- Ideal for characterisation of materials at low beam energies for maximum surface topography
- Stage biasing for low voltage imaging
- Highly diverse BSE imaging capability allowing angle and energy selective BSE detection
- Excellent imaging of beam-sensitive and non-conductive samples
- Fully automated setup of electron beam - optimal imaging conditions guaranteed by In-Flight Beam Tracing™
- Intuitive live SEM sample navigation at magnification as low as 2x
- Optical overview camera for easy sample navigation
- High-speed EDS and EBSD acquisition
- High beam currents up to 400nA
- Schottky field-emission electron source combined with field-free optics for UHR SEM applications
- Imaging surfaces with sub-nm resolution
- Stage biasing for low voltage imaging
- Highly diverse BSE imaging capability using various in-chamber and in-column detectors enabling energy and angular filtering to capture very fine detail
- Equipped with Mistral™ Plasma FIB optimised for both large area studies and for precise TEM or APT sample preparation
- 1mm plasma FIB column field of view enables large area sample prep as well as EDS and EBSD analysis in 3D
- Multi gas injection systems with range precursor gas options
- Integrated Oxford Instrument EDS and EBSD system with optimised TKD geometry
- Advanced techniques for seamless inverted or planar TEM sample geometry enabled by TECAN OptiLift manipulator
- Load lock for fast loading and unloading of samples
- Double tile stage for smooth surface milling of heterogenous materials
- Automated 3D imaging, EDS and EBSD mapping capabilities
- Schottky field-emission electron source combined with field free optics for UHR SEM applications
- Ideal for characterisation of materials at low beam energies for maximum surface topography
- Stage biasing for low voltage imaging
- Highly diverse BSE imaging capability allowing angle and energy selective BSE detection
- Excellent imaging of beam-sensitive and non-conductive samples
- Fully automated setup of electron beam - optimal imaging conditions guaranteed by In-Flight Beam Tracing™
- Intuitive live SEM sample navigation at magnification as low as 2x
- Optical overview camera for easy sample navigation
- High-speed EDS and EBSD acquisition
- High beam currents up to 400nA
Locations
Sydney Microscopy & Microanalysis operates sites across the University of Sydney Camperdown campus. Locations include:
